Overview
The AVS 25th International Conference on Atomic Layer Deposition (ALD 2025) featuring the 12th International Atomic Layer Etching Workshop (ALE 2025) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place Sunday, June 22-Wednesday, June 25, 2025, at the International Convention Center Jeju (ICC Jeju), Jeju Island, South Korea.
As in past conferences, the meeting will be preceded (Sunday, June 22) by one day of tutorials and perspectives and a welcome reception. Sessions will take place (Monday-Wednesday, June 23-25) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 700+. View List of Invited Speakers
View the Technical Program
ALD Program Chairs
Program Chair:
Han-Bo-Ram (Boram) Lee
(Incheon National University, South Korea)
Program Co-Chair:
Bong Jin Kuh
(Samsung Electronics, South Korea)
Program Co-Chair:
Kivin Im
(SK hynix, South Korea)
ALE Program Chairs
Program Co-Chair:
Heeyeop Chae
(Sungkyunkwan University, South Korea)
Program Co-Chair:
Keun Hee Bai
(Samsung Electronics)